8Inch 200mm 4H-N SiC Wafer Conductive dummy grade

Takaitaccen Bayani:

Kamar yadda harkokin sufuri, makamashi da kasuwannin masana'antu ke tasowa, buƙatar abin dogaro, ƙarfin lantarki mai ƙarfi yana ci gaba da girma.Don saduwa da buƙatun ingantaccen aikin semiconductor, masana'antun na'urori suna neman faffadan kayan aikin siliki, kamar 4H SiC Prime Grade portfolio na 4H n -type silicon carbide (SiC) wafers.


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Tags samfurin

Saboda kaddarorinsa na musamman na zahiri da na lantarki, 200mm SiC wafer semiconductor abu ana amfani dashi don ƙirƙirar babban aiki, yanayin zafi, juriya, da na'urorin lantarki masu ƙarfi.8inch SiC substrate farashin yana raguwa a hankali yayin da fasahar ke ƙara haɓaka kuma buƙatun ke girma.Ci gaban fasaha na kwanan nan yana haifar da samar da sikelin samarwa na 200mm SiC wafers.Babban fa'idodin SiC wafer semiconductor kayan kwatankwacin Si da GaAs wafers: Ƙarfin wutar lantarki na 4H-SiC yayin rushewar dusar ƙanƙara ya fi tsari na girma sama da daidaitattun ƙimar Si da GaAs.Wannan yana haifar da raguwa mai mahimmanci a cikin juriya na kan-jihar Ron.Low on-jihar resistivity, haɗe tare da babban halin yanzu yawa da kuma thermal watsin, damar yin amfani da sosai kananan mutu ga ikon na'urorin.Babban haɓakar thermal conductivity na SiC yana rage juriya na thermal na guntu.Kayayyakin lantarki na na'urorin da ke tushen SiC wafers suna da ƙarfi sosai akan lokaci kuma akan kwanciyar hankali, wanda ke tabbatar da babban amincin samfuran.Silicon carbide yana da matukar juriya ga radiyo mai ƙarfi, wanda baya lalata kaddarorin lantarki na guntu.Babban iyakance zafin aiki na kristal (fiye da 6000C) yana ba ku damar ƙirƙirar na'urori masu dogaro sosai don matsananciyar yanayin aiki da aikace-aikace na musamman.A halin yanzu, za mu iya samar da ƙaramin tsari 200mmSiC wafers a hankali kuma a ci gaba da samun wasu haja a cikin sito.

Ƙayyadaddun bayanai

Lamba Abu Naúrar Production Bincike Dummy
1. Ma'auni
1.1 nau'in poly -- 4H 4H 4H
1.2 fuskar fuska ° <11-20>4±0.5 <11-20>4±0.5 <11-20>4±0.5
2. Wutar lantarki
2.1 dopant -- n-nau'in Nitrogen n-nau'in Nitrogen n-nau'in Nitrogen
2.2 resistivity ku · cm 0.015 ~ 0.025 0.01 ~ 0.03 NA
3. Mechanical siga
3.1 diamita mm 200± 0.2 200± 0.2 200± 0.2
3.2 kauri μm 500± 25 500± 25 500± 25
3.3 Matsayin daraja ° [1-100] ± 5 [1-100] ± 5 [1-100] ± 5
3.4 Zurfin Daraja mm 1 ~ 1.5 1 ~ 1.5 1 ~ 1.5
3.5 LTV μm ≤5(10mm*10mm) ≤5(10mm*10mm) ≤10 (10mm*10mm)
3.6 TTV μm ≤10 ≤10 ≤15
3.7 Ruku'u μm -25-25 -45-45 -65-65
3.8 Warp μm ≤30 ≤50 ≤70
3.9 AFM nm ≤0.2 ≤0.2 ≤0.2
4. Tsari
4.1 micropipe yawa ku/cm2 ≤2 ≤10 ≤50
4.2 abun ciki na karfe atom/cm2 ≤1E11 ≤1E11 NA
4.3 TSD ku/cm2 ≤500 ≤1000 NA
4.4 BPD ku/cm2 ≤2000 ≤5000 NA
4.5 TED ku/cm2 ≤7000 ≤10000 NA
5. Kyakkyawan inganci
5.1 gaba -- Si Si Si
5.2 saman gamawa -- Farashin CMP Farashin CMP Farashin CMP
5.3 barbashi e/wafar ≤100(size≥0.3μm) NA NA
5.4 karce e/wafar ≤5, Jimlar Tsawon≤200mm NA NA
5.5 Gefen
kwakwalwan kwamfuta / indents / fasa / tabo / gurɓatawa
-- Babu Babu NA
5.6 Yankunan polytype -- Babu Yanki ≤10% Yanki ≤30%
5.7 alamar gaba -- Babu Babu Babu
6. Baya ingancin
6.1 dawo gama -- C-face MP C-face MP C-face MP
6.2 karce mm NA NA NA
6.3 Gefen lahani na baya
kwakwalwan kwamfuta / indents
-- Babu Babu NA
6.4 Baƙar fata nm Ra ≤5 Ra ≤5 Ra ≤5
6.5 Alamar baya -- Daraja Daraja Daraja
7. Gaba
7.1 baki -- Chamfer Chamfer Chamfer
8. Kunshin
8.1 marufi -- Epi-shirye tare da injin
marufi
Epi-shirye tare da injin
marufi
Epi-shirye tare da injin
marufi
8.2 marufi -- Multi-wafer
kaset marufi
Multi-wafer
kaset marufi
Multi-wafer
kaset marufi

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