Maganin Etching na Sapphire Etched Wafer da aka yi da ruwa da bushewa

Maganin Etching na Sapphire Etched Wafer Mai Daɗi da Busasshe Hoton da Aka Fito

Takaitaccen Bayani:

Ana ƙera wafers ɗin da aka zana da shuɗi ta amfani da manyan abubuwan da aka yi da shuɗi mai launin shuɗi guda ɗaya (Al₂O₃), waɗanda aka sarrafa ta hanyar fasahar photolithography mai zurfi tare da fasahar etching mai danshi da busasshiyar etching. Kayayyakin suna da siffofi masu tsari iri ɗaya, daidaito mai kyau, da kuma kwanciyar hankali na zahiri da sinadarai, wanda hakan ya sa suka dace da aikace-aikacen microelectronics, optoelectronics, marufi na semiconductor, da kuma fannoni na bincike na ci gaba.

Aika mana imel

Siffofi

Cikakken Zane

Maganin Etching na Sapphire Etched Wafer da aka yi da ruwa da bushewa

Gabatarwar Samfuri

Ana yin wafers ɗin da aka zana da saffir ta amfani da substrates masu tsarki guda ɗaya (Al₂O₃), waɗanda aka sarrafa ta hanyar ingantaccen photolithography tare dafasahar etching da danshi da busasshiyar hanyaKayayyakin suna da tsari iri ɗaya, daidaito mai kyau, da kuma kyakkyawan kwanciyar hankali na zahiri da sinadarai, wanda hakan ya sa suka dace da aikace-aikacen microelectronics, optoelectronics, marufi na semiconductor, da kuma fannoni na bincike na ci gaba.

Sapphire sananne ne saboda taurinta da kwanciyar hankalinta na musamman, tare da taurin Mohs na 9, wanda ya fi lu'u-lu'u. Ta hanyar sarrafa sigogin etching daidai, ana iya ƙirƙirar ƙananan gine-gine masu kyau da kuma maimaitawa a saman sapphire, wanda ke tabbatar da gefuna masu kaifi, yanayin daidaito, da kuma kyakkyawan daidaito a tsakanin rukuni-rukuni.

Fasahar Gyaran Gilashi

Gilashin Rigar Ruwa

Yin etching da ruwa yana amfani da magungunan sinadarai na musamman don cire kayan saffir da kuma samar da ƙananan tsarin da ake so. Wannan tsari yana ba da babban aiki, daidaito mai kyau, da ƙarancin kuɗin sarrafawa, wanda hakan ya sa ya dace da yin zane mai faɗi da aikace-aikace tare da matsakaicin buƙatun bayanin bangon gefe.

Ta hanyar sarrafa yadda aka tsara yadda aka tsara maganin, zafin jiki, da lokacin yin amfani da shi, za a iya cimma daidaiton sarrafa zurfin da kuma yanayin saman. Ana amfani da wafers ɗin sapphire masu laushi sosai a cikin abubuwan da aka yi amfani da su a cikin marufi na LED, yadudduka na tallafi na tsari, da kuma zaɓaɓɓun aikace-aikacen MEMS.

Busasshen Ƙera

Busasshen etching, kamar etching na plasma ko reactive ion etching (RIE), yana amfani da ions masu ƙarfi ko nau'in reactive don etching sapphire ta hanyar hanyoyin zahiri da na sinadarai. Wannan hanyar tana ba da ingantaccen anisotropy, babban daidaito, da kuma kyakkyawan ikon canja wurin tsari, wanda ke ba da damar ƙera kyawawan siffofi da ƙananan tsarin ratio masu girma.

Busasshen etching ya dace musamman ga aikace-aikacen da ke buƙatar bangon gefe na tsaye, ma'anar fasali mai kaifi, da kuma sarrafa ma'auni mai tsauri, kamar na'urorin Micro-LED, marufi na semiconductor mai ci gaba, da kuma tsarin MEMS mai aiki mai girma.

Muhimman Features da Fa'idodi

Babban tsarkin sapphire guda ɗaya mai lu'ulu'u mai kyau tare da ƙarfin injiniya mai kyau
Zaɓuɓɓukan tsari masu sassauƙa: etching ɗin rigar ko etching ɗin busasshiyar bisa ga buƙatun aikace-aikace
Babban tauri da juriya ga lalacewa don aminci na dogon lokaci
Kyakkyawan kwanciyar hankali na zafi da sinadarai, wanda ya dace da yanayi mai tsauri
Babban gaskiya da kuma karko na dielectric Properties
Daidaito mai girma da daidaito tsakanin tsari da tsari

Aikace-aikace

Marufi na LED da Micro-LED da kuma gwajin substrates
Masu ɗaukar guntu na Semiconductor da marufi na ci gaba
Na'urori masu auna MEMS da tsarin micro-electromechanical
Abubuwan gani da tsarin daidaitawa daidai
Cibiyoyin bincike da haɓaka tsarin ƙira na musamman

Keɓancewa da Ayyuka

Muna bayar da cikakkun ayyukan keɓancewa, gami da ƙirar tsari, zaɓin hanyar sassaka (daji ko busasshe), sarrafa zurfin sassaka, zaɓin kauri da girman substrate, sassaka gefe ɗaya ko gefe biyu, da kuma matakan goge saman. Tsarin kula da inganci da dubawa mai tsauri suna tabbatar da cewa kowace wafer da aka sassaka da saffir ta cika babban aminci da ƙa'idodin aiki kafin a kawo ta.

Tambayoyin da Ake Yawan Yi - Tambayoyin da Ake Yawan Yi

Q1: Menene bambanci tsakanin etching mai danshi da etching busasshe don saffir?

A:Sassaka da ruwa ya dogara ne akan halayen sinadarai kuma ya dace da babban yanki da kuma sarrafa shi cikin farashi mai rahusa, yayin da sassaka da bushewa ke amfani da dabarun plasma ko ion don cimma daidaito mafi girma, ingantaccen anisotropy, da kuma sarrafa fasali mafi kyau. Zaɓin ya dogara ne akan sarkakiyar tsari, buƙatun daidaito, da la'akari da farashi.

Q2: Wane tsari ne zan zaɓa don aikace-aikacena?

A:Ana ba da shawarar yin etching mai laushi ga aikace-aikacen da ke buƙatar tsari iri ɗaya tare da daidaito matsakaici, kamar daidaitattun abubuwan LED. Etching busasshiyar hanya ta fi dacewa da aikace-aikacen babban ƙuduri, babban rabo, ko Micro-LED da MEMS inda daidaiton yanayin aiki yake da mahimmanci.

Q3: Za ku iya tallafawa tsare-tsare da ƙayyadaddun bayanai na musamman?

A:Eh. Muna tallafawa tsare-tsare na musamman, gami da tsarin zane, girman fasali, zurfin etch, kauri wafer, da girman substrate.

game da Mu

XKH ta ƙware a fannin haɓaka fasaha, samarwa, da kuma sayar da gilashin gani na musamman da sabbin kayan lu'ulu'u. Kayayyakinmu suna ba da kayan lantarki na gani, na'urorin lantarki na masu amfani, da kuma sojoji. Muna ba da kayan gani na Sapphire, murfin ruwan tabarau na wayar hannu, yumbu, LT, Silicon Carbide SIC, Quartz, da wafers na lu'ulu'u na semiconductor. Tare da ƙwarewa mai ƙwarewa da kayan aiki na zamani, mun yi fice a fannin sarrafa samfura marasa tsari, da nufin zama babban kamfanin fasahar zamani na kayan lantarki na optoelectronic.