Cikakken Bayani na Dabarun Saka Fim na Sirara: MOCVD, Magnetron Sputtering, da PECVD

A cikin masana'antar semiconductor, yayin da photolithography da etching sune mafi yawan hanyoyin da aka ambata akai-akai, dabarun saka fim na epitaxial ko bakin ciki suna da mahimmanci daidai. Wannan labarin yana gabatar da hanyoyin shigar da fina-finai na bakin ciki da yawa da aka yi amfani da su wajen ƙirƙira guntu, gami daMOCVD, magnetron sputtering, kumaPECVD.

Me yasa Hanyoyin Fina-Finan Sirara suke da Muhimmanci a Masana'antar Chip?

Alal misali, yi tunanin gurasar da aka gasa a fili. A kan kansa, yana iya ɗanɗano ɗanɗano. Koyaya, ta hanyar goge saman tare da miya daban-daban-kamar ɗanɗano mai ɗanɗano mai ɗanɗano ko malt syrup mai daɗi - zaku iya canza dandano gaba ɗaya. Waɗannan sutura masu haɓaka dandano suna kama dafina-finai na bakin cikia cikin matakan semiconductor, yayin da gurasar da kanta ke wakiltarsubstrate.

A cikin ƙirƙira guntu, fina-finai na bakin ciki suna ba da ayyuka masu yawa na ayyuka - rufi, haɓakawa, wucewa, ɗaukar haske, da sauransu-kuma kowane aiki yana buƙatar takamaiman dabarar ajiya.

1. Karfe-Organic Chemical Vapor Deposition (MOCVD)

MOCVD fasaha ce ta ci gaba sosai kuma madaidaiciyar da aka yi amfani da ita don jigilar manyan fina-finai na semiconductor na bakin ciki da nanostructures. Yana taka muhimmiyar rawa wajen ƙirƙira na'urori kamar LEDs, Laser, da na'urorin lantarki.

Mabuɗin Abubuwan Tsarin MOCVD:

• Tsarin Isar Gas
  Alhaki ga daidai gabatarwar reactants a cikin dauki jam'iyya. Wannan ya haɗa da sarrafa kwarara:

• Gas masu ɗaukar kaya

• Ƙarfe-kwayoyin riga-kafi

• Hydride gas
  Tsarin ya ƙunshi bawuloli masu yawa don canzawa tsakanin haɓakawa da hanyoyin tsaftacewa.

• Reaction Chamber
  Zuciyar tsarin inda ainihin haɓaka kayan abu ke faruwa. Abubuwan sun haɗa da:

  • Graphite susceptor (mai riƙe da substrate)

  • Na'urori masu zafi da zafin jiki

  • Tashoshin gani na gani don saka idanu a cikin wurin

  • Hannun robotic don lodawa/zazzage wafer mai sarrafa kansa

• Tsarin Kula da Girma
  Ya ƙunshi masu sarrafa dabaru na shirye-shirye da kwamfuta mai ɗaukar hoto. Waɗannan suna tabbatar da daidaitaccen kulawa da maimaitawa a duk lokacin aiwatar da ajiya.

• Kulawa a cikin-wuri
  Kayan aiki kamar pyrometers da reflectometers suna aunawa:

  • Kaurin fim

  • Yanayin zafin jiki

  • Substrate curvature
    Waɗannan suna ba da damar amsawa da daidaitawa.

• Tsarin Maganin Ciki
  Yana kula da abubuwan da ke haifar da guba ta amfani da bazuwar zafi ko haɓakar sinadarai don tabbatar da aminci da bin muhalli.

Kanfigareshan Rufe-Coupled Shawa (CCS):

A cikin injina na MOCVD na tsaye, ƙirar CCS tana ba da damar yin allurar iskar gas iri ɗaya ta hanyar madaidaitan nozzles a cikin tsarin shawa. Wannan yana rage girman halayen da bai kai ba kuma yana haɓaka haɗuwa iri ɗaya.

• Themai jujjuyawar graphite susceptorkara taimaka homogenize da iyaka Layer na gas, inganta fim uniformity fadin wafer.

2. Magnetron sputtering

Magnetron sputtering hanya ce ta tara tururi ta jiki (PVD) da ake amfani da ita sosai don adana fina-finai na bakin ciki da sutura, musamman a cikin kayan lantarki, na gani, da yumbu.

Ka'idar Aiki:

1. Material Target
   Tushen kayan da za a ajiye - karfe, oxide, nitride, da dai sauransu - an kafa shi akan cathode.

2. Vacuum Chamber
   Ana aiwatar da tsarin a ƙarƙashin babban injin don guje wa gurɓatawa.

3. Tsarin Plasma
   Gas mara amfani, yawanci argon, ana ionized don samar da plasma.

4. Aikace-aikacen Filin Magnetic
   Filin maganadisu yana taƙaita electrons kusa da manufa don haɓaka haɓakar ionization.

5. Tsari Tsari
   Ions sun jefa bama-bamai a kan abin da aka hari, suna tarwatsa atom da ke tafiya ta cikin ɗakin da kuma ajiye su a cikin ƙasa.

Amfanin Magnetron sputtering:

• Tufafin Fim ɗin Uniformfadin manyan yankuna.

• Iyawa don Ajiye Haɗin Haɗin, gami da gami da yumbu.

• Ma'aunin Tsari Mai Sauƙidon daidaitaccen iko na kauri, abun da ke ciki, da microstructure.

• Ingantacciyar Fimtare da mannewa mai ƙarfi da ƙarfin injiniya.

• Faɗin Daidaituwar Material, daga karafa zuwa oxides da nitrides.

• Aiki mai ƙarancin zafin jiki, dace da zafin jiki-m substrates.

3. Ƙwararren Ƙwararren Ƙwararren Ƙwararren Ƙwararren Ƙwararren Ƙwararren Ƙwararren Ƙwararren Ƙwararren Ƙwararren Ƙwararren Ƙwararren Ƙwararren Ƙwararren Ƙwararrun Ƙwararrun Ƙwararrun Ƙwararrun Ƙwararrun Ƙwararru (PECVD)

Ana amfani da PECVD sosai don sanya fina-finai na bakin ciki kamar silicon nitride (SiNx), silicon dioxide (SiO₂), da silicon amorphous.

Ka'ida:

A cikin tsarin PECVD, ana shigar da iskar gas na farko a cikin ɗakin daki inda aplasma fitarwa mai haskeAna samar da shi ta amfani da:

• RF tashin hankali

• DC high ƙarfin lantarki

• Microwave ko pulsed kafofin

Plasma tana kunna halayen-lokacin iskar gas, yana haifar da nau'ikan amsawa waɗanda ke ajiyewa akan ma'aunin don samar da fim na bakin ciki.

Matakan Sakawa:

1. Samuwar Plasma
   Cike da sha'awar filayen lantarki, iskar gas na farko sun yi ionize don samar da radicals da ions masu amsawa.

2. Amsa da sufuri
   Waɗannan nau'ikan suna fuskantar halayen na biyu yayin da suke motsawa zuwa ƙasa.

3. Ra'ayin Surface
   Bayan isa ga substrate, suna adsorb, amsawa, kuma suna samar da fim mai ƙarfi. Ana fitar da wasu samfuran a matsayin gas.

Amfanin PECVD:

• Kyakkyawan Uniformitya cikin abun da ke ciki na fim da kauri.

• Adhesion mai ƙarfiko da a in mun gwada da low jijiya yanayin zafi.

• Maɗaukakin Maɗaukakin Maɗaukaki, yana sa ya dace da samar da sikelin masana'antu.

4. Dabarun Halayen Fina Finai

Fahimtar kaddarorin fina-finai na bakin ciki yana da mahimmanci don sarrafa inganci. Dabarun gama gari sun haɗa da:

(1) Diffraction X-ray (XRD)

• Manufar: Nazari tsarin crystal, lattice akai-akai, da kuma fuskantarwa.

• Ka'ida: Dangane da Dokar Bragg, yana auna yadda X-rays ke rarrabuwa ta wani abu na crystalline.

• Aikace-aikace: Crystallography, nazarin lokaci, ma'auni, da ƙimar fim na bakin ciki.

(2) Binciken Electron Microscope (SEM)

• Manufar: Kula da ilimin halittar jiki da microstructure.

• Ka'ida: Yana amfani da katako na lantarki don bincika saman samfurin. Sigina da aka gano (misali, na biyu da na baya-baya) suna bayyana cikakkun bayanai.

• Aikace-aikace: Kimiyyar kayan aiki, nanotech, ilmin halitta, da bincike na gazawa.

(3) Atomic Force Microscope (AFM)

• Manufar: Fuskokin hoto a ƙudurin atomic ko nanometer.

• Ka'ida: Bincike mai kaifi yana duba saman yayin da yake riƙe da ƙarfin hulɗar kullun; matsaya na tsaye suna haifar da hoton hoto na 3D.

• Aikace-aikace: Binciken Nanostructure, ma'aunin rashin ƙarfi, nazarin halittu.